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分别采用电子束热蒸发技术和溶胶-凝胶技术在K9基片上镀制了光学厚度相近的ZrO2单层薄膜,测试了两类薄膜的激光损伤阈值。分别采用透射式光热透镜技术、椭偏仪、原子力显微镜和光学显微镜研究了两类薄膜的热吸收、孔隙率、微观表面形貌、激光辐照前薄膜的杂质和缺陷状况以及激光辐照后薄膜的损伤形貌。实验结果表明:两类薄膜的不同损伤形貌与薄膜的热吸收与微观结构有关,物理法制备的ZrO2膜结构致密紧凑,膜层的杂质和缺陷多;化学法制备的ZrO2膜结构疏松多孔,膜层纯净杂质少,激光损伤阈值达26.9 J/cm2;因物理法制备的ZrO2膜拥有更大的热吸收(115.10×10-6)和更小的孔隙率(0.20),其激光损伤阈值较小(18.8 J/cm2),损伤主要为溅射和应力破坏,而化学法制备的ZrO2膜的损伤主要为剥层。理论上对实验结果进行了解释。
The ZrO2 monolayers with similar optical thickness were plated on K9 substrates by electron beam thermal evaporation technique and sol-gel technique, respectively. The laser damage thresholds of two films were tested. The heat absorption, porosity, micro-surface topography of the two kinds of films were studied by transmission light-heat lens technique, ellipsometer, atomic force microscope and optical microscope respectively. The impurities and defects of the films before laser irradiation and the laser irradiation Film damage morphology. The experimental results show that the morphology of ZrO2 films prepared by physical method is dense and compact with many defects and defects. The ZrO2 films prepared by chemical method are porous and porous, The laser induced damage threshold is 26.9 J / cm2. The ZrO2 film prepared by physical method possesses greater heat absorption (115.10 × 10-6) and smaller porosity (0.20). The laser damage threshold Small (18.8 J / cm2), damage mainly sputtering and stress damage, and chemical damage of ZrO2 film is stripped. In theory, the experimental results are explained.