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由于一些半导体器件要求在低温条件下进行薄膜淀积，近年来出现了一些新的低温薄膜淀积设备。介绍新近研制的一种利用紫外光能量辅助ＣＶＤ工艺系统
Since some semiconductor devices are required to be deposited at low temperature, some new low-temperature film deposition apparatuses have appeared in recent years. Introduced recently developed a UV energy-assisted CVD process system