论文部分内容阅读
,Effect of F doping on capacitance-voltage characteristics of SiCOH low-k films metal-insulator-semi
【机 构】
:
School of Physics Science and Technology,Jiangsu Key Laboratory of Thin Films,Soochow University,Suz
【出 处】
:
中国物理B(英文版)
【发表日期】
:
2010年5期
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