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介绍了电子回旋共振等离子体化学气相沉积（简称ECRplasmmaCVD）法淀积980nm大功率半导体激光器两端面光学膜的工艺条件，探索了膜系监控的方法和优越性，讨论了这种淀积方法的优点和淀积的光学膜的优良特性。
The process conditions for the deposition of 980nm high power semiconductor laser two-terminal optical films by electron cyclotron resonance plasma chemical vapor deposition (ECRplasmmaCVD) method are introduced. The methods and advantages of film-based monitoring are also discussed. The advantages of this deposition method are discussed And the excellent properties of the deposited optical film.