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采用Ni-Al共沉积与真空热处理复合技术,即不同颗粒Al(平均尺寸85 nm,3μm)与Ni电沉积,然后进行600℃×4 h低温真空热处理,制备γ’/γ结构Ni-Al纳米复合涂层(A-ENC)及微米复合涂层(A-EMC)。与A-EMC相比,A-ENC基体晶粒尺寸更细小,且γ相中溶入更多的Al。1000℃×20 h高温氧化实验表明:A-ENC的氧化速率远低于A-EMC的,这是由于Al颗粒尺寸的不同,使得纳米颗粒复合转化的γ’/γ涂层氧化初期形成的Al2O3晶核间距大大地缩短,进而缩短Al2O3晶核的间距,从而大大减少了Al2O3核横向生长互相连接成连续Al2O3膜所需要的时间。
Ni-Al co-deposition and vacuum heat treatment composite technology, that is, different particles of Al (average size 85 nm, 3μm) and Ni electrodeposition, and then 600 ℃ × 4h low temperature vacuum heat treatment, prepared γ ’/ γ structure Ni-Al nano Composite coating (A-ENC) and micron composite coating (A-EMC). The grain size of the A-ENC matrix is much smaller than that of A-EMC, and more Al is dissolved in the γ phase. The oxidation experiments at 1000 ℃ × 20 h showed that the oxidation rate of A-ENC was much lower than that of A-EMC due to the different size of Al particles, which resulted in the formation of Al2O3 The spacing of the nuclei is greatly shortened, which in turn shortens the spacing of the Al2O3 nuclei and greatly reduces the time required for the lateral growth of the Al 2 O 3 nuclei to interconnect into a continuous Al 2 O 3 film.