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刻蚀表面仿真是研究等离子体刻蚀工艺过程机理的重要手段.在刻蚀表面仿真方法中,刻蚀表面演化模型和离子刻蚀产额模型直接决定了刻蚀表面演化结果.但现有的刻蚀表面演化模型不够精确,且目前离子刻蚀产额模型主要来自分子动力学仿真和物理实验,而实际加工过程十分复杂,等效的离子刻蚀产额包含很多因素.针对这些问题,首先对当前的刻蚀表面演化模型进行改进,同时重新定义了离子刻蚀产额模型的优化目标,并利用实际刻蚀加工数据来优化离子刻蚀产额模型.为缩短优化模型所用时间,采用并行方法来加速优化过程.最后,将得到的离子刻蚀产额模型参数应用于采用元胞自动机法的刻蚀工艺实际仿真过程中.实验结果表明,该优化建模方法确实提高了仿真的精确度,同时优化过程所用时间也大大减少.
Etching surface simulation is an important method to study the mechanism of plasma etching process.In the simulation method of surface etching, the surface evolution model and the ion etching yield model directly determine the surface evolution of etching, but the existing Etching surface evolution model is not accurate enough, and the current ion etching yield model comes mainly from molecular dynamics simulation and physical experiments, and the actual processing is very complicated, the equivalent ion etching yield contains many factors.For these problems, the first The current etching surface evolution model is improved, and the optimization goal of ion etching yield model is redefined, and the actual etching process data is used to optimize the ion etching yield model.In order to shorten the optimization model, parallelism Method to accelerate the optimization process.Finally, the ion etching yield model parameters obtained are applied to the actual simulation of the etching process using the cellular automata method.The experimental results show that the optimization modeling method does improve the accuracy of the simulation Degrees, while optimizing the process time is also greatly reduced.