论文部分内容阅读
采用扫描电镜 (SEM)、X射线衍射仪、X射线能谱 (EDS)和俄歇电子能谱仪 (AES) ,研究了基片偏压对磁控溅射沉积 Al- Zn镀层组成和结构的影响。随着基片偏压的增加镀层的 Zn含量呈降低趋势 ,在不同基片偏压下可获得不同择优取向的 Al- Zn镀层
The composition and structure of Al-Zn coatings deposited by magnetron sputtering were investigated by SEM, XRD, EDS and AES. influences. With the increase of substrate bias, the Zn content of the coating tends to decrease. Different preferred Al-Zn coatings can be obtained under different substrate bias