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本文分两部分，第一部分为重点，从扩散方程出发讨论考夫曼离子源放电室电子在磁场中的扩散运动，从基本物理概念出发定性地讨论电子在磁场中回旋半径与放电电压的关系，以平板电极中带电粒子运动的泊松方程出发推导出引出的离子束流与加速电压二分之三次方关系（齐尔德定律）；从而给出了ＬＳＫ－６００型离子蚀刻机离子源的设计基础。第二部分简单讨论考夫曼离子源在工业中的各种应用，包括溅射、蚀刻、改性和沉积等。
This article is divided into two parts. The first part is the focus. From the diffusion equation, the electron diffusion in the Kaufman ion source discharge chamber is discussed. From the basic physical concept, the relationship between the gyration radius and the discharge voltage in the magnetic field is discussed qualitatively. Based on the Poisson equation of charged particle movement in the plate electrode, the relation between the induced ion beam current and the accelerating voltage is dichotomously cubic (Zielde’s law); thus, the LSK-600 ion etching ion source basics of design. The second part briefly discusses Kaufman ion source applications in the industry including sputtering, etching, modification and deposition.