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本文提出了一种新颖的结合自组装技术和电子束直写曝光以及选择性化学沉积制备图案化薄膜方法。利用X-射线光电子能谱(XPS),扫描电子显微镜(SEM),透射电子显微镜(TEM)紫外可见光谱仪(Analytic Jena AG)进行了表征。结果表明该方法取得了选择性较好的图案化金薄膜微结构图形。文中对胶体金纳米颗粒尺寸的选择以及金薄膜图案的粘附性能也进行了探讨。该方法有望应用于微/纳电子工业中。
In this paper, a novel method of fabricating a patterned thin film by a combination of self-assembly techniques and electron beam direct write exposure as well as selective chemical deposition is proposed. Characterization was performed using X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), and transmission electron microscopy (TEM) UV-Vis spectroscopy (Analytic Jena AG). The results show that this method has achieved a better selectivity of the patterned gold film microstructure. The selection of colloidal gold nanoparticle size and the adhesion properties of gold thin film patterns are also discussed. The method is expected to be used in micro / nano electronics industry.