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采用光学显微镜、显微干涉仪、扫描电子显微镜等,对在不同工艺条件下制成的硫化锌光学介质膜层的表面形貌和断面结构进行了观察,并对其厚度进行了测量。观察和测量的结果表明:蒸镀膜层厚度约为1μm,未经特定工艺处理前,晶粒较粗,结构不致密,断面为典型的柱状结构,其机械牢固性差。经特定工艺处理后的膜层,其断面仍为柱状结构。但表面形态表明晶粒较细,结构较致密,其机械牢固性极佳。
The surface topography and cross-sectional structure of the ZnS dielectric films fabricated under different processing conditions were observed by optical microscope, microscopic interferometer and scanning electron microscope, and their thickness were measured. The results of observation and measurement show that the thickness of the deposited film is about 1μm. Before being processed by a specific process, the grains are coarse and the structure is not dense. The cross section is a typical columnar structure with poor mechanical robustness. After a specific process of the film, the section is still columnar structure. However, the surface morphology shows that the grains are finer and the structure is denser, and the mechanical firmness is excellent.