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通过控制变量法研究了激光能量密度、加工速度、重复频率、刻蚀次数等激光加工参数对紫外激光诱导等离子体刻蚀Pyrex7740玻璃刻蚀深度和表面刻蚀质量(包括边缘是否齐整、崩边、碎裂等)的影响规律。结果表明,以铜膜作为吸收层的紫外激光诱导等离子体刻蚀Pyrex7740玻璃的激光能量密度阈值在1.54~2.10J/cm~2之间,且在一定范围内激光能量密度越大,刻蚀深度越深,等离子体越稳定,刻蚀质量越好;激光刻蚀速度过慢或过快都会造成等离子体不稳定,对刻蚀质量产生不良影响,即并非光斑重叠度越大刻蚀效果越好。研究结果为激光诱导等离子体精密刻蚀Pyrex7740玻璃及其他光学透明材料刻蚀工艺优化和参数选取提供参考。
The effects of laser processing parameters, such as laser energy density, processing speed, repetition frequency and etching times, on the etching depth and surface quality of Pyrex7740 glass by ultraviolet laser-induced plasma etching (including the edge alignment, edge collapse, Fragmentation, etc.) the impact of laws. The results show that the laser energy density threshold of the Pyrex7740 glass is 1.54 ~ 2.10J / cm ~ 2 when the copper film is used as the absorber, and the laser energy density is higher within a certain range. The etching depth The deeper the plasma, the more stable the plasma, the better the etching quality. If the laser etching speed is too slow or too fast, the plasma will be unstable and have an adverse effect on the etching quality, that is, the greater the light spot overlap, the better the etching effect . The results provide reference for the optimization of etching process and parameter selection of Pyrex7740 glass and other optically transparent materials by laser-induced plasma etching.