Numerical simulation of chemical vapor deposition reaction in polysilicon reduction furnace

来源 :中南大学学报:英文版 | 被引量 : 0次 | 上传用户:jeffzhangjf
下载到本地 , 更方便阅读
声明 : 本文档内容版权归属内容提供方 , 如果您对本文有版权争议 , 可与客服联系进行内容授权或下架
论文部分内容阅读
Three-dimensional model of chemical vapor deposition reaction in polysilicon reduction furnace was established by considering mass, momentum and energy transfer simultaneously. Then, CFD software was used to simulate the flow, heat transfer and chemical r
其他文献
Hot granule medium pressure forming(HGMF) process is a new process in which granule medium replaces the medium in existing flexible-die hot forming process, suc
创新能力的培养是当前研究生教育的灵魂,合理、科学的学科结构与课程设置是研究生创新能力培养的基础。第二军医大学药学院从2001年起开设了《现代药物色谱分析》和《生物体内