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研究了Si3N4层在ZrN/Si3N4纳米多层膜中的晶化现象及其对多层膜微结构与力学性能的影响.一系列不同Si3N4层厚度的ZrN/Si3N4纳米多层膜通过反应磁控溅射法制备.利用X射线衍射仪、高分辨透射电子显微镜和微力学探针表征了多层膜的微结构和力学性能.结果表明,由于受到ZrN调制层晶体结构的模板作用,溅射条件下以非晶态存在的Si3N4层在其厚度小于0·9nm时被强制晶化为NaCl结构的赝晶体,ZrN/Si3N4纳米多层膜形成共格外延生长的柱状晶,并相应地产生硬度升高的超硬效应.Si3N4随层厚的进一步增加又转变为非晶态,多层膜的共格生长结构因而受到破坏,其硬度也随之降低.
The crystallization of Si3N4 layer in ZrN / Si3N4 multilayer films and its effect on the microstructure and mechanical properties of the multilayer films were investigated.The results show that a series of ZrN / Si3N4 multilayer films with different Si3N4 layer thicknesses are formed by reactive magnetron sputtering The microstructure and mechanical properties of multilayer films were characterized by X-ray diffraction, high-resolution transmission electron microscopy and micromechanical probe.The results show that due to the template effect of crystal structure of ZrN modulation layer, The amorphous Si3N4 layer is forcibly crystallized into a pseudocrystal of NaCl structure at a thickness of less than 0.9 nm. The ZrN / Si3N4 nanomembrane forms a columnar crystal grown by coextensive epitaxial growth and accordingly has an increased hardness Of the super-hard effect.Si3N4 with the further increase in layer thickness and into amorphous, multi-layer coherent growth structure thus damaged, its hardness also will be reduced.