报道了利用光发射谱 (OES)和朗谬尔探针对热阴极直流放电等离子体化学气相沉积金刚石薄膜的等离子体条件进行原位研究的部分结果 ,研究了几种过程参数变化中等离子体状态 ,并与金刚石膜的沉积相联系。当CH4 浓度变化时 ,CH基团的发射强度和电子密度ne 的变化表现出相似趋势 ,均出现一极大值。而在高CH4 浓度 ,C2 的发射出现。在气压变化过程中 ,CH的发射强度和ne 均随气压的升高而下降 ,C2 的发射强度变化不大。用OES和朗谬尔探针测量的电子温度Te 所显示的结果是一致的。在这些过程中 ,电子碰撞应该是CH发射的主要机制 ,C2 的发射应该来源于化学发光或热激发 Some results of in-situ studies on the plasma conditions of hot cathode DC discharge plasma CVD diamond films using optical emission spectroscopy (OES) and Langmuir probes have been reported. Several plasma parameters, such as plasma state, And associated with the deposition of diamond films. When the concentration of CH4 changes, the emission intensity of CH groups and the electron density ne show a similar trend, all showing a maximum value. At high CH4 concentrations, C2 emission occurs. In the process of pressure change, the emission intensity and ne of CH decreased with the increase of pressure, and the emission intensity of C2 did not change much. The electron temperature Te measured with OES and Langmuir probes shows the same result. In these processes, the electron collision should be the main mechanism of CH emission, and the emission of C2 should come from chemiluminescence or thermal excitation