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以Mg0.4Zn0.6O为靶材,采用射频磁控溅射方法在石英玻璃衬底上沉积MgxZn1–xO薄膜。利用能量色散X射线谱分析了不同衬底温度下制备的薄膜中Mg含量;用X射线衍射和吸收光谱研究了物相结构及其光学性质。结果表明:不同衬底温度下制备的MgxZn1–xO薄膜均为六方纤锌矿结构,且具有良好的c轴取向。衬底温度为200℃时,制备的薄膜样品的(002)方向衍射峰强度最大,表明此温度下薄膜的结晶程度最高。衬底温度为300℃时,制备的薄膜样品中Mg的含量最高为0.438 mol,其室温下吸收光谱的吸收边位于281 nm。
With Mg0.4Zn0.6O as target material, MgxZn1-xO films were deposited on quartz glass substrate by RF magnetron sputtering. The content of Mg in the films prepared at different substrate temperatures was analyzed by energy dispersive X-ray spectroscopy. The phase structure and optical properties were studied by X-ray diffraction and absorption spectroscopy. The results show that MgxZn1-xO films prepared at different substrate temperatures have hexagonal wurtzite structure with good c-axis orientation. When the substrate temperature is 200 ℃, the (002) diffraction peak intensity of the prepared thin film sample is the highest, indicating that the crystallization degree of the film is the highest at this temperature. When the substrate temperature is 300 ℃, the content of Mg in the prepared thin film sample is up to 0.438 mol, and the absorption edge of the absorption spectrum at room temperature is located at 281 nm.