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Ultra-thin amorphous Si-C-N films,down to 2nm,have been synthesized by MW-ECR plasma enhanced unbalanced magnetron sputtering.The friction coefficient of the film is only 0.11,determined in dry friction tests against the GCr15 ball at a load of 400mN for 20min.The films exhibit good protection against corrosion when they are immersed in a more severe corrosion environment of 0.1 mol/L oxalic acid for 12 h compared to the usual conditions (0.05 mol/L,4 min) used in current computer industries.These good properties can be attributed to the smooth,dense and pore free structure of the film.These indicate that.the Si-C-N film synthesized by the present technique may be a promising protective coating for read/write heads and other magnetic storage devices.