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利用高分辨电感耦合等离子体质谱测定半导体级高纯硝酸中的痕量金属杂质,用直接稀释法,把浓硝酸稀释10倍后,用标准加入法进行上机检测,前处理简单、快速,避免了在样品前处理时的污染问题。高分辨电感耦合等离子体质谱可以消除多分子离子干扰,降低检出限,提高定量准确性。该方法检出限为0.01～8.6 ng/L,加标回收率为84%～111%。
Determination of trace metal impurities in semiconductor grade high purity nitric acid by high resolution inductively coupled plasma mass spectrometry. Using the direct dilution method, the concentrated nitric acid is diluted by 10 times, and then tested by the standard addition method. The pretreatment is simple, rapid and avoid Pollution problems during sample preparation. High-resolution inductively coupled plasma mass spectrometry can eliminate multi-molecular ion interference, reduce the detection limit, and improve quantitative accuracy. The detection limit of this method was 0.01 ~ 8.6 ng / L, and the recoveries were between 84% and 111%.