多数的重氮萘醌体系正性光致抗蚀材料(以下简称抗蚀材料)都是用线性酚醛树脂作为成膜组分,用重氮萘醌的酯化产物作为感光性组分的光分解型感光材料.这种材料以其高反差的成像性能广泛地应用于电子、印刷及精密加工等各个领域中.常用的光致抗蚀剂及平版印刷的ＰＳ版材大多用的是 Most of diazonaphthoquinone system positive photoresist materials (hereinafter referred to as resist material) are made of phenolic resin as a film-forming component, the use of diazonaphthoquinone esterification product as a photosensitive component of photolysis Type photosensitive material. This material with its high contrast imaging performance widely used in electronics, printing and precision machining and other fields. Commonly used photoresist and lithographic PS plates are mostly used