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采用射频磁控溅射法在离子注氮的高速钢基体上沉积制备c-BN薄膜,主要研究离子注氮层对c-BN薄膜相结构和内应力的影响;采用各种现代分析方法对沉积的薄膜进行了表征分析,包括傅立叶红外光谱(FTIR)、X射线光电子能谱(XPS)和原子力显微镜(AFM)等分析方法;试验结果表明:高速钢基体上离子注氮有利于立方氮化硼含量的提高和薄膜内应力的降低,同时注氮处理的高速钢基体上沉积的薄膜表面形貌平整,结晶性较好。并采用X射线衍射分析(XRD)对高速钢基体的离子注氮层进行了相结构分析,探索研究了离子注氮层对c-BN薄膜生长的影响。
The c-BN film was deposited on a high-speed steel substrate with ion-nitrogen injection by radio-frequency magnetron sputtering. The effect of ion-implanted nitrogen on the phase structure and internal stress of c-BN film was studied. Various modern analytical methods were used to analyze the deposition (FTIR), X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). The results show that the ion-implanted nitrogen on the high-speed steel substrate is good for cubic boron nitride Content and film stress reduction, while nitrogen-treated high-speed steel substrate deposited film surface morphology is flat, good crystallinity. X-ray diffraction (XRD) was used to analyze the phase structure of ion-implanted nitrogen in the high-speed steel substrate. The influence of the ion-implanted nitrogen on the growth of c-BN thin films was investigated.