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在电子束蒸发沉积制备ZrO2薄膜的过程中,采用石英晶体振荡法监控膜厚和沉积速率。用NKD7000分光光度计测量了ZrO2薄膜的折射率和膜厚,用原子力显微镜分别观测了不同工作气压和沉积速率下薄膜的表面形貌、均方根粗糙度。结果表明,随着工作气压的升高,膜层的结构变疏松,薄膜的折射率和均方根粗糙度都随之减小。随着沉积速率的增大,膜层的结构变致密,薄膜的折射率和均方根粗糙度都随之增大。并且从工具因子(TF)的角度得到了证实。实际镀膜过程中应该根据激光薄膜的应用需要选用合适的工艺条件,在允许的均方根粗糙度范围内提高膜层的结构致密性和折射率。
During electron beam evaporation deposition of ZrO2 thin films, quartz crystal oscillation method was used to monitor the film thickness and deposition rate. The refractive index and film thickness of ZrO2 thin film were measured by NKD7000 spectrophotometer. The surface morphology and root mean square roughness of thin films were observed by atomic force microscope at different working pressure and deposition rate respectively. The results show that with the increase of working pressure, the structure of the film becomes loose and the refractive index and root mean square roughness of the film decrease. As the deposition rate increases, the structure of the film becomes denser and the refractive index and root mean square roughness of the film increase. And from the tool factor (TF) point of view has been confirmed. The actual coating process should be based on the application of the laser film needs to select the appropriate process conditions, in order to allow the rms roughness of the film structure to enhance the compactness and refractive index.