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用X射线衍射(XRD)相定量外推法和X射线光电子能谱(XPS)峰强度比(Iw_(4f)/I_(i-p))法定量测定了WO_3在硅胶表面的最大分散量,两种方法的结果一致,为1.8×10_(-4)克WO_3/米~2(即4.6×10~(17)W原子/米~2)。表明WO_3在硅胶表面呈单层分散,但不是密置单层分散,WO_3在硅胶表面的单层覆盖率只有9%。
The maximum dispersion of WO_3 on the surface of silica gel was quantitatively determined by XRD (XRD) quantitative extrapolation and XPS peak intensity ratio (Iw_ (4f) / I_ (ip)) method. The results of the method are consistent, which is 1.8 × 10 ~ (-4) g WO_3 / m ~ 2 (4.6 × 10 ~ (17) W atoms / m ~ 2). It shows that WO_3 is monolayer dispersed on the surface of silica gel, but it is not densely dispersed in monolayer. The coverage of WO_3 on silica gel surface is only 9%.