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本文介绍一种新的干法腐蚀工艺——化学辅助离子束蚀刻(CAIBE),或者称作离子束辅助蚀刻(IBAE),它具有各向异性腐蚀,高的腐蚀选择比,对铝、硅、砷化镓等材料有高的腐蚀速率等特点,并使表面辐射损伤减到最小。
This paper presents a new dry etching technique called chemical assisted ion beam etching (CAIBE), also known as ion beam assisted etching (IBAE), which has anisotropic corrosion, high corrosion selectivity, high sensitivity to aluminum, silicon, Gallium arsenide and other materials have high corrosion rate and other characteristics, and to minimize surface radiation damage.