随着光电子技术和精密加工技术的快速发展,光电子元件的尺寸也越来越小,在制作这些元件的技术中,电子束刻蚀作为制备光子晶体最为稳定可靠的方法,其发展被人们所关注.为此介绍了用电子束刻蚀工艺制备二维光子晶体的方法. With the rapid development of optoelectronic technology and precision machining technology, the size of optoelectronic components is getting smaller and smaller. In the technologies for fabricating these components, electron beam lithography is the most stable and reliable method for preparing photonic crystals and its development has been attracting attention In this paper, a method of preparing two - dimensional photonic crystal by electron beam etching is introduced.