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利用直流磁控溅射技术在石英基片上沉积厚度为35～112nm的钛薄膜.采用X射线衍射仪和原子力显微镜分别对薄膜的微结构和表面形貌进行观测,用分光光度计测量样品的透射和反射光谱.选用德鲁特光学介电模型,通过拟合样品的透射和反射光谱数据的方法求解钛薄膜的折射率、消光系数和厚度.结果表明,随着厚度的增加,(100)面衍射峰强度增强,薄膜的结晶性能提高;膜厚为56nm时,样品的表面为多孔结构,而大于56nm时表面为连续膜的球形颗粒结构;随膜厚的增加,表面颗粒直径逐渐增大,表面粗糙度减小.在400～2 000nm波长范围内,薄膜的透射率随膜厚的增加而减小,反射率升高;折射率在2.5与3.4之间,消光系数在0.7与1.4之间,折射率和消光系数均随膜厚的增加而增加.
Titanium thin films with a thickness of 35 ~ 112nm were deposited on a quartz substrate by DC magnetron sputtering.The microstructure and surface morphology of the films were observed by X-ray diffractometer and atomic force microscope respectively, and the transmittance of the samples was measured by spectrophotometer And Reflectance Spectra of the Titanium Thin Films Using the Druse optical dielectric model, the refractive index, extinction coefficient and thickness of the titanium thin films were calculated by fitting the transmission and reflection spectral data of the samples.The results show that the (100) plane The surface of the sample is porous structure when the film thickness is 56nm, and the spherical particle structure whose surface is continuous film when the film thickness is 56nm. With the increase of the film thickness, the diameter of the surface particles increases gradually, The surface roughness decreases.The transmittance of the film decreases with the increase of the film thickness and the reflectivity increases in the wavelength range of 400-2000 nm.The refractive index is between 2.5 and 3.4 and the extinction coefficient is between 0.7 and 1.4 , Refractive index and extinction coefficient increase with the increase of film thickness.