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在电弧离子镀靶后端加入轴对称线圈磁场,制备了TiN-Cu纳米复合膜。观察线圈磁场强度对靶表面电弧斑点游动速率和弧柱形状的影响,及其对沉积薄膜的表面形貌、沉积速率、纳米压痕硬度和弹性模量的影响。结果表明,提高线圈磁场强度可提高电弧斑点的游动速率,进而降低靶表面金属液滴喷射几率,减小沉积薄膜中大颗粒的尺寸和数量。X射线衍射(XRD)谱显示,沉积薄膜只含有TiN相,未出现金属Cu或其化合物的衍射峰;薄膜呈现明显的(111)晶面择优取向。随着线圈磁场强度的提高薄膜沉积速率、压痕硬度和弹性模量先增加,达到最大值后又略有减少,其最大硬度和弹性模量分别达到35.46GPa和487.61GPa。
A TiN-Cu nanocomposite film was prepared by adding the magnetic field of the axisymmetric coil to the rear end of the arc ion plating target. The influence of the magnetic field intensity of the coil on the arc spot motional rate and arc column shape of the target surface was observed and its effect on the surface morphology, deposition rate, nanoindentation hardness and elastic modulus of the deposited films was observed. The results show that increasing the magnetic field strength of the coil can increase the arching rate of the arc spot, thereby reducing the probability of jetting the metal droplets on the target surface and reducing the size and number of large particles in the deposited film. The X-ray diffraction (XRD) spectra show that the deposited films contain only TiN phase and no diffraction peak of metal Cu or its compound appears. The film shows a preferential orientation of (111) crystal plane. As the magnetic field strength of the coil increases, the film deposition rate, indentation hardness and elastic modulus increase first, and then decrease slightly. The maximum hardness and elastic modulus reach 35.46GPa and 487.61GPa respectively.