Evolution of surface morphology and optical characteristics of 1.3-\mum In0.5Ga0.5As/GaAs quantum dots (QDs) grown by molecular beam epitaxy (MBE) are investigated by atomic force microscopy (AFM) and photoluminescence (PL). After deposition of 16 monola
为了满足工业上对织物缺陷检测的实时性要求,提出一种基于S-YOLOV3(Slimming You Only Look Once Version 3)模型的织物实时缺陷检测算法。首先使用K均值聚类算法确定目标先验框,以适应不同尺寸的缺陷;然后预训练YOLOV3模型得到权重参数,利用批归一化层中的缩放因子γ评估每个卷积核的权重,将权重值低于阈值的卷积核进行剪枝以得到S-YOLOV3模型,实现模型压缩和