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研究了轴对称磁场对电弧离子镀弧斑运动的影响规律,利用有限元分析软件FEMM对轴对称磁场的分布进行了模拟,采用SHT-V型磁场测试仪测试了磁场强度,分析了靶面不同磁场分量的分布规律.从电弧斑点放电的物理机制出发,探讨了不同磁场分量和轴对称磁场对电弧离子镀弧斑运动的影响机制.结果表明,轴对称磁场通过影响空间正电荷密度n~+的分布而作用于弧斑运动;随着轴对称磁场横向分量的增加,电弧斑点由随机运动逐渐转变为向靶面边缘扩展的旋转运动,弧斑运动速度加快,电弧电压升高,电流下降;当横向分量增加到临界强度(B_T≈30 Gs)时,弧斑在靶材边缘稳定的快速旋转运动并在靶沿处上下抖动,弧斑分裂,靶面中心处每隔0.5 s左右出现多个细的圆斑线,然后很快向外扩展消失;靶材边缘出现明显的刻蚀轨道.
The influence of axisymmetric magnetic field on the arc spot arc movement was studied. The distribution of axisymmetric magnetic field was simulated by finite element analysis software FEMM. The magnetic field intensity was tested by SHT-V magnetic field tester. Based on the physical mechanism of arc spot discharge, the influence mechanism of different magnetic field components and axisymmetric magnetic field on arcing arc spot arc motions was studied. The results show that the axial symmetry magnetic field is affected by the positive charge density n ~ + Arc spot increases from random motion to rotational motion expanding to the edge of the target surface, the arc spot velocity increases, the arc voltage increases, the current decreases; When the transverse component increases to the critical intensity (B_T≈30 Gs), the arc spot rotates rapidly and steadily at the edge of the target and jitter up and down at the target edge. The arc spot splits. A number of arc spot appears at the center of the target every 0.5 s Thin circular lines, and then quickly disappear outward expansion; target edge obvious etching orbit.