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将铁电液晶(FLC)的本征电路模型扩展到以FLC为调制层,a Si∶H为光敏层的光寻址空间光调制器(OASLM),建立了FLC OASLM的宏模型。用电路方法模拟了控制光强度以及外部激励信号的特征参数对FLC OASLM响应速度的影响。模拟结果表明,FLC OASLM的响应速度随写入光强度和激励信号幅度的增大而加快,随擦除光强度和激励信号频率的提高而减慢。同时,激励信号存在一个上界频率,当频率参数取值超过界值时,响应峰值迅速下降。
The intrinsic circuit model of ferroelectric liquid crystal (FLC) is extended to the OASLM with FLC as the modulation layer and a Si: H as the photosensitive layer. A macromodel of FLC OASLM is established. The influence of the control light intensity and the characteristic parameters of external excitation signal on the response speed of FLC OASLM was simulated by the circuit method. The simulation results show that the response speed of FLC OASLM increases with the increase of write light intensity and excitation signal amplitude, and decreases with the increase of erasing light intensity and excitation signal frequency. At the same time, the excitation signal has an upper bound frequency. When the frequency parameter value exceeds the threshold value, the response peak rapidly decreases.