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讨论了在采用直流电弧等离子体喷射CVD工艺沉积大面积无衬底自支撑金刚石厚膜时遇到的若干技术问题．在制备过程中经常出现的膜炸裂现象，主要是由于膜和衬底材料线膨胀系数差异引起的巨大热应力，而衬底表面状态的控制、沉积过程中工艺参数的优化和控制也是一个重要的因素．因此，必须对整个金刚石厚膜沉积过程进行严格而系统的控制，才能有效地保证获得无裂纹大面积金刚石自支撑厚膜．
Several technical problems encountered in the deposition of a large area free-standing self-supporting diamond thick film using a DC arc plasma jet CVD process are discussed. The frequently occurring membrane burst during the preparation process is mainly due to the huge thermal stress caused by the difference in linear expansion coefficients of the membrane and the substrate material. The control of the surface condition of the substrate and the optimization and control of process parameters in the deposition process are also important factor. Therefore, the entire diamond thick film deposition process must be strictly and systematically controlled in order to effectively ensure a crack-free large-area diamond self-supporting thick film.