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高硬度的含氧化物纳米多层膜在工具涂层上具有重要的应用价值 .研究了TiN SiO2 纳米多层膜的晶体生长特征和超硬效应 .一系列具有不同SiO2 和TiN调制层厚的纳米多层膜采用多靶磁控溅射法制备 ;采用x射线衍射、x射线能量色散谱、高分辨电子显微镜和微力学探针表征了多层膜的微结构和力学性能 .结果表明 ,虽然以单层膜形式存在的TiN和SiO2 分别形成纳米晶和非晶结构 ,它们组成多层膜时会因晶体生长的互促效应而呈现共格外延生长的结构特征 .在SiO2 调制层厚度约小于 1nm时 ,多层膜呈现强烈的 (111)织构 ,并伴随着硬度和弹性模量的显著上升 ,最高硬度和弹性模量分别达到 4 4 5和 4 73GPa .进一步增加SiO2 层的厚度 ,由于SiO2 层呈现非晶态 ,多层膜的共格外延生长受到抑制 ,硬度也相应降低 .TiN调制层厚度的改变虽对多层膜的生长结构和力学性能也有影响 ,但并不明显 .
The high hardness oxide nanometer multilayer film has important application value on the tool coating.The crystal growth characteristics and superhardness effect of TiN SiO2 multilayer film have been studied.A series of nanometer with different SiO2 and TiN modulation layer thicknesses The multi-layer films were prepared by multi-target magnetron sputtering. The microstructures and mechanical properties of multilayer films were characterized by X-ray diffraction, X-ray energy dispersive spectroscopy, high resolution electron microscopy and micromechanical probe. TiN and SiO2 existing in the form of monolayer form nanocrystalline and amorphous structures, respectively, which form a structural characteristic of coextensive epitaxial growth due to the mutual effect of crystal growth when they form a multilayer film.When the thickness of the SiO2 modulation layer is less than 1 nm (111) texture with a significant increase of hardness and elastic modulus, the maximum hardness and elastic modulus reached 445 and 473 GPa, respectively.With the further increase of the thickness of SiO2 layer, Layer appears amorphous, the coexistence of multi-layer film epitaxial growth is inhibited, the hardness is also reduced.Although the thickness of the TiN modulation layer changes the growth structure and mechanical properties of multi-layer film, but also Obviously.