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在新兴的集成电路技术中技术革新搞得很快,而且经济效果也很显著。由于硅片尺寸的增大以及图形尺寸的微细化引起了集成度的不断提高,这就提出了降低器件成本的问题,当然这些革新成果必然为各厂家所注目。我们在本文中介绍一下:卡诺PLA—500FA型掩模对准仪,该仪器能很经济地制做2μ宽线条的器件。在这种仪器中,接近式、软接触式及接触式光刻可用一个开关来转换,而且可以根据图形所要求的分辨率来选择光刻形式。另外,由于仪器附有远紫
Technological innovation is fast in the emerging integrated circuit technology, and its economic effect is also remarkable. Due to the increase of the size of the silicon and the miniaturization of the size of the graphics, the integration level is continuously raised. This raises the issue of reducing the device cost. Of course, these innovations inevitably attract the attention of various manufacturers. In this article, we introduce: Cano PLA-500FA mask alignment instrument, the instrument can be economically made 2μ wide line of devices. In this instrument, proximity, soft-contact and contact lithography can be switched with a single switch and lithography can be selected based on the desired resolution of the graphic. In addition, due to the instrument with far purple