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为了研究分析室温下溅射沉积的金属异质结界面演化的尺度依赖性,制备了不同调制周期和Ni:Al调制比等特征结构的Ni/Al型金属纳米多层膜。结合X射线衍射、多光束光学应力传感器(MOSS)实时薄膜曲率测量,研究了应力演化行为,并在此基础上分析推测纳米多层膜在生长过程中的界面特性。结果表明,由于各亚层内各向异性纳米晶结构,多层膜界面具有不对称性,这是由于界面处Ni原子向Al晶格内的不对称扩散行为所致。当此类型多层膜具备最小调制周期和最低Ni:Al调制比这2个特征参量时,上述不对称扩散行为由于界面累积效应变得更为加剧。
In order to study the scale dependence of the evolution of the metal heterojunction deposited at room temperature by sputtering, a Ni / Al-based metal nano-multilayer with different modulation periods and Ni: Al modulation ratio was fabricated. Combined with real-time film curvature measurement of X-ray diffraction and multi-beam optical stress sensor (MOSS), the stress evolution behavior was studied. Based on the analysis, the interfacial properties of the nanostructured multilayers during growth were analyzed. The results show that due to the anisotropic nanocrystalline structure in each sublayer, the multi-layer interface has asymmetry due to the asymmetric diffusion of Ni atoms into the Al lattice at the interface. When this type of multi-layer film has two characteristic parameters of the minimum modulation period and the minimum Ni: Al modulation ratio, the asymmetric diffusion behavior described above becomes more severe due to the interface cumulative effect.