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为了降低冶金级硅粉中金属杂质的含量,本文比较了微波场、球磨活化、恒温水浴等不同反应条件对冶金级硅中金属杂质去除效果的影响.实验结果表明,微波场作用下杂质Fe、Al、Ca、Ti的去除效率分别为83%,73%,93%,54%;球磨活化作用下杂质Fe、Al、Ca、Ti的去除最率分别为78%,69%,83%,46%;恒温水浴作用下Fe、Al、Ca、Ti的去除效率分别为72%,54%,67%,38%.微波场作用效果要明显优于球磨活化和恒温水浴作用,且微波场作用时间少干另外两者,探讨了微波场湿法提纯冶金级硅、球磨活化湿法提纯冶金级硅的原理.“,”To decrease the residual of metallic impurities in industrial silicon, the influence of removal effect of metallic impurities in metallurgical grade silicon under different conditions, such as microwave field, planetary mill, aqueous thermostat. The experimental results show that the removal efficiencies of iron, aluminum, calcium, titanium in metallurgical grade silicon under microwave field were 83 %, 73 %, 93%, 54% , respectively; and the removal efficiencies of iron, aluminum, calcium, titanium in metallurgical grade silicon under planetary mill were 78 %, 69 %, 83 %, 46 %, respectively; and the removal efficiencies of iron, aluminum, calcium, titanium in metallurgical grade silicon under aqueous thermostat were 72 %, 54 %, 67 %, 38 % , respectively. The time of reaction under microwave field was less than the others. The principle of hydrometallurgical purification of industrial silicon under microwave field and under planetary mill was discussed, respectively.