引言合成金刚石膜有许多种工艺,如碳靶的离子束喷溅法,烃类用氢稀释的射频或微波等离子体CVD法以及烃类的热钨丝CVD法。世界上正致力于研究合成立方系氮化硼(C-BN)膜中的气体。然而,C-BN膜的合成,除离子束喷溅法外,在等离子体法和热CVD工艺中并没有得到成功。用离子束喷溅法,形成的C-BN结构部分为无定形的BN(α-BN)结构。如上所述,在合成C-BN和金刚石结构的工艺中似乎在气源上略有差异.从这一点出发,我们研究了等离 Introduction Synthetic diamond films have many processes, such as ion beam sputtering of a carbon target, radio frequency or microwave plasma CVD of hydrocarbons diluted with hydrogen, and hot-filament CVD of hydrocarbons. The world is working on the synthesis of cubic boron nitride (C-BN) film of gas. However, the synthesis of C-BN films has not been successful in the plasma and thermal CVD processes except for ion beam sputtering. By ion beam sputtering, the C-BN structure formed is an amorphous BN (a-BN) structure. As mentioned above, it appears that there is a slight difference in gas source in the process of synthesizing C-BN and diamond structures. From this point of view,