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利用各向异性腐蚀和键合工艺,提出了一种新的自停止腐蚀方法,该方法可以得到大于1μm厚的均匀硅膜,可用于微传感器研制。
Using anisotropic etching and bonding process, a new self-stop corrosion method is proposed, which can obtain a uniform silicon film larger than 1μm thick and can be used for the development of micro-sensors.