倒锥形磁控溅射源是七十年代中期发展起来的一种新型磁控溅射源。文中在简述了 这种源的结构与工作原理的基础上，详细地论述了倒锥形磁控溅射源的靶形选择、靶面 磁场强度计算、靶与基片距离的确定、靶冷却水量的计算以及倒锥靶与水冷套的特殊结 合等问题。 Inverted conical magnetron sputtering source is a new type of magnetron sputtering source developed in the mid-1970s. Based on the brief description of the structure and working principle of this kind of source, the target shape selection, the calculation of the magnetic field intensity of the target surface, the determination of the distance between the target and the substrate, and the target cooling The calculation of water and the special combination of inverted cone target and water cooling jacket.