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非平衡磁控溅射(U BM S)技术近年来得到了广泛地应用。采用该技术制备的类金刚石薄膜(DLC)具有许多独特的性质。本文利用正交实验方法,对非平衡磁控溅射技术制备无氢DLC膜增透膜进行了研究,得到了影响薄膜光学性能的主要因素和最佳的制备工艺。结果表明,非平衡磁控溅射制备的无氢DLC膜具有较宽的光谱透明区,锗基底单面沉积DLC膜,其峰值透射率达到61.4%,接近理论值。
Unbalanced magnetron sputtering (U BM S) technology has been widely used in recent years. Diamond-like carbon films prepared by this technique (DLC) have many unique properties. In this paper, a non-hydrogen-doped DLC film antireflection coating prepared by unbalanced magnetron sputtering was studied by means of orthogonal experiment. The main factors affecting the optical properties of the film and the best preparation process were obtained. The results show that the hydrogen-free DLC film prepared by unbalanced magnetron sputtering has a wide spectral transparent region. The DLC film deposited on one side of the germanium substrate has a peak transmittance of 61.4% which is close to the theoretical value.