论文部分内容阅读
含氢类金刚石膜(diamond-like carbon,DLC)的超低摩擦特性与其沉积制备过程密切相关.采用分子动力学模拟的方法,计算了以CH3基团为沉积物,在多种不同入射能下制备含氢DLC膜的动力学过程.通过沉积原子数统计分析、薄膜密度和sp杂化分析考察了含氢DLC膜的结构特性.通过比较模拟结果,发现随着入射轰击能量的增加,含氢类金刚石膜中碳的含量总体上呈现增加的趋势;在含氢DLC膜中所沉积的氢原子数存在峰值,峰值前后变化趋势相反,大于80eV以后趋于饱和与稳定,薄膜相对密度也随之增加,达到50eV时趋于稳定值;膜中碳原子比氢原子具有更强的成键能力,易与基底发生化学吸附;沉积源基团的氢含量决定生长成膜以后的薄膜氢含量,沉积源基团中的氢含量高,则所生长薄膜的氢含量高.
The ultra-low frictional properties of diamond-like carbon (DLC) films are closely related to the deposition process.The molecular dynamics simulation is used to calculate the interfacial friction between CH3 groups as sediments and under different incident energies The kinetic process of preparation of DLC films containing hydrogen was studied.The structural characteristics of hydrogen-containing DLC films were investigated by statistical analysis of deposition atomic numbers, thin-film density and sp hybridization analysis.Compared with the simulation results, it was found that with the increase of incident bombardment energy, The content of carbon in diamond-like carbon films shows a trend of increase in general; the number of hydrogen atoms deposited in hydrogen-containing DLC films has a peak, the trend of the peak changes in the opposite direction, after more than 80eV tends to saturation and stability, the relative density of the film also will be Increase to reach 50eV stable value; film carbon atoms than the hydrogen atom has a stronger ability to bond easily with the substrate chemical adsorption; hydrogen content of the deposition source group determines the growth of the film after film hydrogen content, deposition The hydrogen content in the source group is high, then the hydrogen content of the grown film is high.