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研究了激光惯性约束聚变 (ICF)实验中一种基础基准靶埋点靶的制备工艺过程。埋点靶的制备过程主要包括CH膜的制备、埋点的定位和埋点材料的制备。其中 ,CH薄膜的制备及其性质是制备埋点靶的关键工艺环节。最后给出了埋点靶的制备工艺流程。
The preparation process of a basic target buried target in laser inertial confinement fusion (ICF) experiment was studied. The preparation of the buried target mainly includes the preparation of the CH film, the location of the buried point and the preparation of the buried material. Among them, the preparation of CH film and its nature is the key process of preparation of buried target. Finally, the preparation process of the buried target is given.