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采用直流反应磁控溅射系统,选择独立Ti靶在3003AlMn合金表面在不同氮流量下制备(Ti,Al)N薄膜,采用扫描电镜、能谱分析、X射线衍射、极化曲线试验、磨损试验、薄膜厚度和显微硬度试验等手段表征了薄膜的沉积速率、化学成分、微结构和力学性能。结果表明,以独立Ti靶在铝衬底表面可以直接生成晶粒尺寸细小与基底结合良好的(Ti,Al)N薄膜,同时可以增加铝合金的表面硬度,提高表面耐蚀性能及表面光泽度。氮流量对(Ti,Al)N薄膜影响显著,氮流量为7cm3/min时制备的(Ti,Al)N薄膜晶粒最细小、致密,小尺寸纳米化的晶粒对提高3003AlMn合金耐磨损性和耐蚀性最佳,但沉积速率低,硬度增幅小。
The (Ti, Al) N thin films were prepared on the surface of 3003AlMn alloy under different nitrogen flux by direct reactive magnetron sputtering system. The microstructures of the films were characterized by SEM, EDS, XRD, , Film thickness and microhardness test methods to characterize the film deposition rate, chemical composition, microstructure and mechanical properties. The results show that (Ti, Al) N thin films with fine grain size and good bonding with substrate can be directly formed on the surface of aluminum substrate by using independent Ti target, meanwhile the surface hardness of aluminum alloy can be increased, the surface corrosion resistance and surface glossiness . Nitrogen flow has a significant effect on (Ti, Al) N thin films. The (Ti, Al) N thin film with the smallest and most compact and compact nano-sized grains prepared at a nitrogen flow rate of 7 cm3 / min can improve the wear resistance of 3003AlMn alloy The best performance and corrosion resistance, but the deposition rate is low, small increase in hardness.