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以二氧化硅、氮化硅薄膜为例论述了紫外光能量辅助化学汽相淀积的反应机制。二氧化硅薄膜的组成为纯ＳｉＯ２；氮化硅薄膜中含有氧元素，组成为氮氧化硅（ＳｉｘＮＹＯｚ）。
Taking silicon dioxide and silicon nitride thin films as an example, the reaction mechanism of UV energy assisted chemical vapor deposition is discussed. The composition of the silicon dioxide film is pure SiO2; the silicon nitride film contains oxygen and the composition is silicon oxynitride (SixNYOz).