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同时获得高去除率和超光滑平整的表面是硬盘磁头自由磨粒抛光的矛盾,研究自由磨粒抛光材料去除规律可以优化抛光工艺。采用修正环型浮动块抛光机抛光GMR硬盘磁头,采用场发射扫描电镜和原子力显微镜观察磁头表面形貌。通过改变抛光盘的表面形貌、抛光液以及抛光压力等抛光条件,获得不同的磁头表面形貌,磁头表面有磨粒产生的划痕和少量微坑,显示材料主要以微切削方式去除。划痕和微坑的深浅、数量随抛光条件的不同而改变。进一步采用纳米压痕仪测量磁头表面材料去除率,并研究抛光盘、抛光压力和抛光液等参数与材料去除率的关系,建立了GMR磁头材料去除率模型,并可预测表面粗糙度,与实验结果基本相吻合。据此可以优化工艺,在获得最佳表面质量的同时,获得高的去除率,兼顾效率与品质的因素。
At the same time to obtain high removal rate and ultra-smooth surface is hard disk head free abrasive polishing contradiction, the study of free abrasive polishing material removal rules can optimize the polishing process. A modified ring-type slider polisher was used to polish the head of GMR hard disk. The field emission scanning electron microscope and atomic force microscope were used to observe the surface morphology of the head. By changing the surface morphology of the polishing disc, polishing solution and polishing pressure and other polishing conditions to obtain different head surface morphology, head surface with abrasive scratches and a small amount of micro-pits, showing that the material is mainly micro-cutting removal. Scratches and pit depth, the number varies with the polishing conditions. The material removal rate of the head surface was measured by nano indenter. The relationship between material removal rate, such as polishing disc, polishing pressure and polishing liquid was studied. The model of GMR head material removal rate was established, and the surface roughness was predicted. The results are basically consistent. This optimizes the process to achieve high surface removal, high removal rates, and efficiency and quality.