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To investigate the effect of low energy ion implantation on maize pollen germination and cytosolic Ca2+ distribution during pollen germination process, the argon ion (Ar+) with energy of 30 keV, dose of 0.78 ×1015-13×1015 ion/cm2 was implanted into maize pollen by irradiation, and the germination of pollen and cytosolic Ca2+ distribution during pollen germination process of the Ar+ implanted pollen were studied. The results showed that when been irradiated with Ar+ with dose of 5.2×1015 ion/cm2, the germination rate of maize pollen increased remarkably, while implantation of ions with dose exceeding 5.2×1015 ion/cm2 sharply decreased the germination rate of maize pollen. Meanwhile, tracing of esterified Ca2+ fluorescence probe fluo-3 AM for intact pollen showed that variation of cytosolic Ca2+ concentration was consistent with the change of pollen fertility. The dynamics of cytosolic Ca2+ concentration caused by low energy ion implantation may be concluded as the initial effects of pollen germination.
To investigate the effect of low energy ion implantation on maize pollen germination and cytosolic Ca2 + distribution during pollen germination process, the argon ion (Ar +) with energy of 30 keV, dose of 0.78 × 1015-13 × 1015 ion / cm2 was implanted into maize pollen by irradiation, and the germination of pollen and cytosolic Ca2 + distribution during pollen germination process of the Ar + implanted pollen were studied. The results was that when been irradiated with Ar + with dose of 5.2 × 1015 ion / cm2, the germination rate of maize pollen increased remarkably, while implantation of ions with dose exceeding 5.2 × 1015 ion / cm2 sharply decreased the germination rate of maize pollen. Meanwhile, tracing of esterified Ca2 + fluorescence probe fluo-3 AM for intact pollen showed that variation of cytosolic Ca2 + concentration was consistent with the change of pollen fertility. The dynamics of cytosolic Ca2 + concentration caused by low energy ion implantation may be concluded as the initial effects of pollen germination.