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在薄膜生长的成核阶段，稳定聚集体将逐渐覆盖衬底表面．同时，薄膜的生长将发生在被覆盖的衬底部分，而成核则发生在未被覆盖的部分．本文研究了衬底表面被覆盖的程度对薄膜成核和生长的影响，对广泛应用的薄膜理论，给出一些修正公式．结果表明，成核速率正比于衬底表面未被覆盖面积的平方．而薄膜理论认为成核速率是时间常量，似显得粗糙．
During the nucleation phase of thin film growth, stable aggregates gradually cover the substrate surface. At the same time, the growth of the film will occur on the portion of the substrate being covered while the nucleation takes place on the uncovered portion. In this paper, the effects of the substrate surface coverage on the nucleation and growth of the films are studied. Some correction formulas are given for the widely used film theory. The results show that the nucleation rate is proportional to the square of the uncovered area of the substrate surface. The thin film theory that the rate of nucleation is a time constant, it seems rough.