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用脉冲偏压电弧离子镀技术在玻璃基片上制备均匀透明的TiO2薄膜.利用X射线衍射仪、原子力显微镜、扫描电子显微镜、紫外-可见透射光谱仪和纳米压痕仪等手段,对不同脉冲负偏压下合成薄膜的相结构、微观结构、表面形貌、力学和光学性能进行表征.结果表明,沉积态薄膜为非晶态.脉冲负偏压对薄膜性能有明显的影响.随偏压的增加,薄膜厚度、硬度和弹性模量均先增大后减小,前者峰值出现在100—200V负偏压范围,后两者则在250—350V范围.300V负偏压时薄膜硬度最高,薄膜达到原子级表面光滑度,均方根粗糙度为0.113nm,薄膜折射率也最高,对波长为550nm光的折射率达到已有报道的最高值(2.51).同时,对脉冲负偏压影响薄膜性能的机理进行了分析.
A uniform and transparent TiO2 thin film was prepared on a glass substrate by pulsed bias arc ion plating technique. The effects of different negative impulses The phase structure, microstructure, surface morphology, mechanical and optical properties of the synthesized films were characterized.The results show that the deposited films are amorphous, and the pulse negative bias has a significant effect on the film properties.With the increase of bias voltage , The film thickness, hardness and elastic modulus first increased and then decreased, the former peak appeared in 100-200V negative bias range, the latter two in the 250-350V range 300V negative bias voltage when the film hardness is highest, the film reaches Atomic surface smoothness, root mean square roughness of 0.113nm, the refractive index of the film is also the highest, for the wavelength of 550nm light refractive index reached the highest reported (2.51). At the same time, the impact of negative pulse bias film performance The mechanism was analyzed.