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利用等离子体化学气相沉积系统在直流电压源和射频源的双重激励下,以康宁7059玻璃为衬底制备了氢化硅薄膜.通过测定氢化硅薄膜Raman光谱,对薄膜微结构进行了表征;建立氢化硅薄膜的光吸收模型,计算出薄膜的光吸收系数和光学带隙,和实验结果基本一致,说明该模型符合实验结果;并利用该模型计算的光吸收系数和光学带隙,结合AMPS软件对设计的太阳电池结构进行了模拟,给出的I-V特性曲线变化趋势与实验结果基本符合,同时对实验结果与模拟结果存在差异的原因进行了分析,并给出合理解释.
Hydride silicon thin films were prepared by Corning 7059 glass under the double excitation of DC voltage source and RF source by using plasma chemical vapor deposition system.The microstructure of the films was characterized by measuring Raman spectra of silicon hydride films, The optical absorption coefficient and optical band gap of the film are calculated, which is consistent with the experimental results. The results show that the model is in good agreement with the experimental results. Using the light absorption coefficient and the optical band gap calculated by the model, combined with AMPS software The designed solar cell structure is simulated. The trend of IV characteristic curve given is basically in line with the experimental results. At the same time, the reasons for the difference between the experimental and simulation results are analyzed and a reasonable explanation is given.