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探讨了用微波等离子体化学气相沉积法(MPCVD)在Si(100)衬底上加偏压电场和不加偏压电场情况下金刚石膜的成核行为.并经用原子力显微镜(AFM)分析,偏压电场对金刚石成核有促进作用.文章也分析了偏压电场所以能促进金刚石成核的机制.
The nucleation behavior of diamond films by microwave plasma chemical vapor deposition (MPCVD) on a Si (100) substrate with and without bias was investigated. Atomic force microscopy (AFM) It is analyzed that the bias electric field can promote the nucleation of diamond.The mechanism of the biased electric field that can promote the nucleation of diamond is also analyzed.