论文部分内容阅读
研究了微量薄摸Ｎｉ—Ｗ合金镀层中钨的光度法，进行了镀层的溶解、介质选择、显色反应、放置时间及部分离子的干扰试验。测量范围为０μｇ／ｍＬ～１５μｇ／ｍＬ。
The photometry of tungsten in the thin Ni-W alloy coating was studied. The dissolution of the coating, medium selection, color reaction, storage time and partial ion interference were studied. The measurement range is 0μg / mL ~ 15μg / mL.