Fe-Cu thin films of 0.2μm in thickness with different Cu contents were prepared by using r.f. magnetron sputtering onto glass substrate. The effect of sputtering param-eters, including Ar gas pressure and input rf power, on the structure and magnetic properties was investigated. It was found that when the power is lower than 70 W, the structure of the films remained single bcc-Fe phase with Cu solubility of up to 50at.%. TEM observations for the bcc-Fe phase showed that the grain size was in the nanometer range of less than 20nm. The coercivity of Fe-Cu films was largely affected by not only Ar gas pressure but also rf power, and reached about 2.5Oe in the pressure of 0.67-6.67Pa and in the power of less than WOW. In addition, saturation magnetization, with Cu content less than 60at. %, was about proportional to the con-tent of bcc-Fe. When Cu content was at 60at.%, however, saturation magnetization was much smaller than its calculation value. Fe-Cu thin films of 0.2 μm in thickness with different Cu contents were prepared by using rf magnetron sputtering onto glass substrates. The effect of sputtering param-eters, including Ar gas pressure and input rf power, on the structure and magnetic properties was investigated . It was found that when the power is lower than 70 W, the structure of the films was single single bcc-Fe phase with Cu solubility of up to 50 at.%. TEM observations for the bcc-Fe phase showed that the grain size was in the nanometer range of less than 20 nm. The coercivity of Fe-Cu films was largely affected by not only only argon gas but also rf power, and reached about 2.5Oe in the pressure of 0.67-6.67 Pa and in the power of less than WOW .%, However, saturation magnetization was smaller than than 60 at.%, Was about proportional to the con-tent of bcc-Fe.