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对用于193nm减反射膜的基底材料和薄膜材料的光学性能进行了解析,同时对沉积技术和主要沉积工艺参数进行了分析与优化选择,并在此基础上进行了193nm大角度入射减反射膜的设计、制备及检测,实现了入射角为68°~72°范围内单面透射率大于96%,剩余反射率小于1%。同时计算了线宽压窄模块棱镜在镀膜前后的单程能量损耗,肯定了实现大角度减反射膜的必要性。
The optical properties of the substrate material and the thin film material for the 193nm anti-reflection coating were analyzed. At the same time, the deposition technology and the main deposition process parameters were analyzed and optimized. Based on this, the 193nm high-angle incident antireflection film The results show that the single-side transmittance is more than 96% and the residual reflectance is less than 1% when the incident angle is 68 ° ~ 72 °. At the same time, the single-pass energy loss before and after coating of the linear width narrowing module prism is calculated, which affirms the necessity of realizing the high-angle anti-reflection film.